Atomic layer deposition of thermoelectric Al-doped ZnO (AZO) films on flexible ion track etched PET templates

Abstract

Atomic scale thickness control and superior conformality make ALD the optimal deposition method for preparing nanostructured coatings and in the case of TE materials coatings with tailored thermal and electronic properties. Even more freedom for “the atomic architect” is given by the development of MLD (Molecular Layer Deposition, “The ALD of organic materials”) and the ability to prepare organic/inorganic hybrid coatings and superlattice structures. With superlattice structures thermal conductivity of TE thin films can be significantly reduced e.g. with ZnO:HQ Hydroquinone) by a factor of 1/50. The most promising field of application of thin film TE devices is wearable electronics, miniaturized biomedical devices and sensors.